Invention Patent
- Patent Title: SUPERCONDUCTING FIELD-EFFECT TRANSISTORS WITH INVERTED MISFET STRUCTURE AND METHOD FOR MAKING THE SAME
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Application No.: CA2058780Application Date: 1992-01-06
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Publication No.: CA2058780A1Publication Date: 1992-07-08
- Inventor: BEDNORZ JOHANNES G , MANNHART JOCHEN D , MUELLER CARL A
- Applicant: IBM
- Assignee: IBM
- Current Assignee: IBM
- Priority: EP91810006 1991-01-07
- Main IPC: H01L39/22
- IPC: H01L39/22 ; B05D5/12 ; H01B12/00 ; H01L21/336 ; H01L39/14 ; H01L39/24
Abstract:
SZ9-90-015 SUPERCONDUCTING FIELD-EFFECT TRANSISTORS WITH INVERTED MISFET STRUCTURE AND METHOD FOR MAKING THE SAME This field-effect transistor comprises a conductive substrate serving as the gate electrode, an insulating barrier layer, and a superconducting channel layer on top of the barrier layer. The superconductor layer carries a pair of mutually spaced electrodes forming source and drain, respectively. The substrate is provided with an appropriate gate contact. The substrate consists of a material belonging to the same crystallographic family as the barrier layer. In a preferred embodiment, the substrate is niobium-doped strontium titanate, the barrier layer is undoped strontium titanate, and the superconductor is a thin film of a material having a lattice constant at least approximately similar to the one of the materials of the substrate and barrier layers. A preferred material of this type is YBa2Cu3O7-.delta., where O ? .delta. ? 0.5.
Information query
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