Invention Patent
- Patent Title: X-RAY EXPOSURE APPARATUS X-RAY EXPOSURE APPARATUS
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Application No.: CA2079562Application Date: 1992-09-30
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Publication No.: CA2079562CPublication Date: 1997-01-07
- Inventor: KASUMI KAZUYUKI , ABE NAOTO , EBINUMA RYUICHI , HASEGAWA TAKAYUKI
- Applicant: CANON KK
- Assignee: CANON KK
- Current Assignee: CANON KK
- Priority: JP27837391 1991-09-30; JP28362791 1991-10-03; JP28917191 1991-10-08; JP28928391 1991-10-08; JP28927491 1991-10-08; JP31183691 1991-10-30
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G1/00 ; H01L21/027
Abstract:
An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the Xray apparatus.
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