公开(公告)号：DE69128655D1

公开(公告)日：1998-02-19

申请号：DE69128655

申请日：1991-02-28

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  SUDA SHIGEYUKI ,  UZAWA SHUNICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/53

Abstract: An exposure apparatus for transferring a pattern of an original (1) onto a workpiece (2) by using first light, includes a blocking member (4) for defining a rectangular exposure region on the workpiece. The blocking member (4) has a function for blocking the first light, wherein, through the exposure region defined by the blocking member (4), exposure for the pattern transfer can be effected. A detecting device (6) detects a positional deviation between the original (1) and the workpiece (2), by using second light different from the first light, wherein the blocking member (4) has a portion for transmitting the second light such that the detecting device (6) can detect the positional deviation with the second light passed through that portion of the blocking member.

公开(公告)号：DE69535412D1

公开(公告)日：2007-04-12

申请号：DE69535412

申请日：1995-03-31

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  FUJIOKA HIDEKO ,  YONEYAMA YOSHITO

IPC: G03F7/20 ,  G03F7/16 ,  G03F7/30 ,  H01L21/00

Abstract: A processing system includes a first processing chamber (101) in which a first process is to be performed, a second processing chamber (130) in which a second process is to be performed, and a device for introducing an inactive gas, having been used in said first processing chamber for the first process, into the second chamber for reuse thereof. The gas subsequently used in the second chamber is introduced back into the first chamber for reuse of the gas. At least a portion of the circulated gas is purified to improve its purity. A purity sensor (110) detects the purity of gas discharged from the second chamber and, in accordance with the detection, the capacity of gas purification is adjusted.

公开(公告)号：DE69225378D1

公开(公告)日：1998-06-10

申请号：DE69225378

申请日：1992-09-30

Applicant: CANON KK

Inventor： KASUMI KAZUYUKI ,  ABE NAOTO ,  EBINUMA RYUICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20

Abstract: An X-ray apparatus is disclosed which includes a mirror (2) having a reflection surface, for expanding an X-ray beam (1) in a predetermined direction, a detecting device (8a, 8b) for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device (6) for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

公开(公告)号：DE69531019D1

公开(公告)日：2003-07-17

申请号：DE69531019

申请日：1995-03-31

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  FUJIOKA HIDEHIKO ,  YONEYAMA YOSHITO

IPC: G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  H01L21/00 ,  G02B26/12

Abstract: A processing system includes a first processing chamber (101) in which a first process is to be performed, a second processing chamber (130) in which a second process is to be performed, and a device for introducing an inactive gas, having been used in said first processing chamber for the first process, into the second chamber for reuse thereof. The gas subsequently used in the second chamber is introduced back into the first chamber for reuse of the gas. At least a portion of the circulated gas is purified to improve its purity. A purity sensor (110) detects the purity of gas discharged from the second chamber and, in accordance with the detection, the capacity of gas purification is adjusted.

公开(公告)号：DE60334592D1

公开(公告)日：2010-12-02

申请号：DE60334592

申请日：2003-08-21

Applicant: CANON KK

Inventor： OHGUSHI NOBUAKI ,  MIYAKE AKIRA ,  HASEGAWA TAKAYUKI ,  ITO JUN

IPC: G03F7/20 ,  G21K1/04 ,  H01L21/027

公开(公告)号：DE69401689D1

公开(公告)日：1997-03-20

申请号：DE69401689

申请日：1994-07-20

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  TANAKA YUTAKA ,  FUJIOKA HIDEHIKO

IPC: C23C14/56 ,  B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/205 ,  H01L21/67

公开(公告)号：CA2079562C

公开(公告)日：1997-01-07

申请号：CA2079562

申请日：1992-09-30

Applicant: CANON KK

Inventor： KASUMI KAZUYUKI ,  ABE NAOTO ,  EBINUMA RYUICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20 ,  H05G1/00 ,  H01L21/027

Abstract: An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the Xray apparatus.

公开(公告)号：DE602004029435D1

公开(公告)日：2010-11-18

申请号：DE602004029435

申请日：2004-11-26

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI

IPC: G01M11/02 ,  G03F7/20 ,  H01L21/027

公开(公告)号：DE69531019T2

公开(公告)日：2004-01-08

申请号：DE69531019

申请日：1995-03-31

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  FUJIOKA HIDEHIKO ,  YONEYAMA YOSHITO

IPC: G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  H01L21/00 ,  G02B26/12

Abstract: A processing system includes a first processing chamber (101) in which a first process is to be performed, a second processing chamber (130) in which a second process is to be performed, and a device for introducing an inactive gas, having been used in said first processing chamber for the first process, into the second chamber for reuse thereof. The gas subsequently used in the second chamber is introduced back into the first chamber for reuse of the gas. At least a portion of the circulated gas is purified to improve its purity. A purity sensor (110) detects the purity of gas discharged from the second chamber and, in accordance with the detection, the capacity of gas purification is adjusted.

公开(公告)号：DE69225378T2

公开(公告)日：1998-09-24

申请号：DE69225378

申请日：1992-09-30

Applicant: CANON KK

Inventor： KASUMI KAZUYUKI ,  ABE NAOTO ,  EBINUMA RYUICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20

Abstract: An X-ray apparatus is disclosed which includes a mirror (2) having a reflection surface, for expanding an X-ray beam (1) in a predetermined direction, a detecting device (8a, 8b) for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device (6) for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.