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    3.
    发明专利
    未知

    公开(公告)号：DE69634768T2

    公开(公告)日：2006-02-02

    申请号：DE69634768

    申请日：1996-10-04

    Applicant: CANON KK

    Inventor： KORENAGA NOBUSHIGE ,  EBINUMA RYUICHI

    IPC: B23Q5/28 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/68 ,  H02K41/03 ,  H02K41/035

    Abstract: It is an object to provide a compact, lightweight, and inexpensive stage apparatus. A stage apparatus for moving a stage (2) in a predetermined direction includes a stage accelerating/decelerating thrust generation unit (9) arranged along the moving direction, a stage speed control thrust generation unit (8) arranged to be parallel to the stage accelerating/decelerating thrust generation unit, an accelerating unit (29a) for generating a stage accelerating thrust at a portion corresponding to the stage accelerating interval of the accelerating/decelerating thrust generation unit (9), a decelerating unit (29b) for generating a stage decelerating thrust at a portion corresponding to the stage decelerating interval of the accelerating/decelerating thrust generation unit (9), and a speed control unit (28) for controlling the stage thrust generated by the speed control thrust generation unit (8) at least within a predetermined range between the accelerating interval and the decelerating interval.

    4.
    发明专利
    未知

    公开(公告)号：DE69128207D1

    公开(公告)日：1998-01-02

    申请号：DE69128207

    申请日：1991-03-12

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  EBINUMA RYUICHI

    IPC: G03F7/20 ,  G21K1/02 ,  H01L21/027

    Abstract: A method of manufacture of semiconductor devices wherein a radiation beam is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, wherein a first beam which is a portion of the radiation beam is directed to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, wherein an opening is formed at least in a portion of a support for supporting the window, wherein a second beam which is another portion of the radiation beam is extracted through the opening, and wherein, by using the second beam, any deviation of the first beam with respect to the wafer is detected and corrected.

    6.
    发明专利
    未知

    公开(公告)号：DE69216552D1

    公开(公告)日：1997-02-20

    申请号：DE69216552

    申请日：1992-10-28

    Applicant: CANON KK

    Inventor： EBINUMA RYUICHI

    IPC: G21K5/04 ,  G03F7/20 ,  H01L21/027

    Abstract: X-rays enter an airtight chamber (4) through a beam duct (15), pass through a transmission window (5), and expose a wafer (1) and mask (3) disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck (2a) and a mask holder (6), respectively. The mask holder includes a pressure sensor (7), which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit (17), and is transmitted to a control unit (19), which controls a driving unit (18) of a shutter (8). By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.

    8.
    发明专利
    未知

    公开(公告)号：DE68927482D1

    公开(公告)日：1997-01-09

    申请号：DE68927482

    申请日：1989-01-27

    Applicant: CANON KK

    Inventor： MIZUSAWA NOBUTOSHI ,  TANAKA YUTAKA ,  EBINUMA RYUICHI

    IPC: G12B5/00 ,  B23Q1/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/00

    Abstract: A positioning device includes a movable table supported by a rectilinear guide mechanism or rotary mechanism, the movable table being moved by a driving mechanism so as to position a member, to be conveyed, placed on the movable table, with respect to a predetermined site. After the member being conveyed is conveyed to the predetermined site, the conveyed member is contacted intimately to a stationary table which provides a reference with respect to the attitude of the conveyed member, such that the attitude correction of the conveyed member is attained.

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