The invention discloses a double patterning layout design method. A double patterning layout design method comprises defining critical paths comprising a first path and a second path on a schematic circuit, and defining a double patterning layout divided into a first mask layout having a first color and a second mask layout having a second color, the double patterning layout corresponding to the schematic circuit. The defining of the double patterning layout comprises anchoring the critical paths on the schematic circuit.