In this substrate-processing apparatus, a plurality of patterning units are arrayed in the widthwise direction of a substrate such that movement in the lengthwise direction of the substrate causes patterns formed on the substrate by pattern lines from the respective patterning units to join together. A control unit stores, in advance, calibration information regarding the positional relationships between the pattern lines formed on the substrate by the respective patterning units, and on the basis of said calibration information and movement information outputted by a movement-measuring device, the control unit adjusts the positions at which the patterns are formed on the substrate by patterning beams from the respective patterning units.