Provided is a method for manufacturing a solar cell comprising: a step of forming a first semiconductor layer on an upper surface of a semiconductor wafer and forming a second semiconductor layer having a polarity different from that of the first semiconductor layer on a lower surface of the semiconductor wafer; a step of forming a first transparent conductive layer on an upper surface of the first semiconductor layer while exposing a portion of the first semiconductor layer to the outside, and forming a second transparent conductive layer on a lower surface of the second semiconductor layer while exposing a portion of the second semiconductor layer to the outside; and a step of plasma-treating at least one of the first transparent conductive layer and the second transparent conductive layer, wherein the plasma treatment step comprises a step of removing a portion of the first semiconductor layer exposed to the outside and a portion of the second semiconductor layer.