This is a method for carrying out that the stress optical waveguide polarization of silicon-based silica dioxide with symmetrical structure isní»t sensitive, including that: (1) forming silica-dioxide lower cladding in the silicon substrate by methods of thermal oxidation, flame hydrolytic decomposition or plasma enhancing chemical vapour deposition, (2) adjusting high refractive index SiON compensation layer of adjustable waveguide birefraction factor by method of plasma enhancing chemical vapour deposition, (3) symmetrical etching half of it by method for reactive ion etching in the waveguide center, (4) accreting core layer by method for flame hydrolytic decomposition or plasma enhancing chemical vapour deposition, (5) proceeding burnishing, (6) etching core layer by method for reactive ion etching to form optical waveguide layer of strip-shaped symmetrical structure, (7) accreting upper cladding by method for flame hydrolytic decomposition or plasma enhancing chemical vapour deposition.íí