Invention Patent
- Patent Title: VAPOR GROWTH APPARATUS
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Application No.: JP19094896Application Date: 1996-07-19
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Publication No.: JPH1036189APublication Date: 1998-02-10
- Inventor: YAMAMOTO SUNAO , ISHIKAWA HIDETO
- Applicant: SONY CORP
- Assignee: SONY CORP
- Current Assignee: SONY CORP
- Priority: JP19094896 1996-07-19
- Main IPC: C30B25/08
- IPC: C30B25/08 ; C23C16/18 ; C23C16/44 ; C23C16/455 ; H01L21/205
Abstract:
PROBLEM TO BE SOLVED: To provide a vapor growth apparatus capable of performing the vapor growth (especially MOCVD) by a simple constitution by installing plural vapor growing parts in parallel through opening and closing bulbs to general feeding parts of raw materials when vapor growing from plural base plates. SOLUTION: This vapor growth apparatus, especially an organometallic vapor phase growing apparatus is constituted by installing plural vapor growing reaction parts (constituted of reaction furnaces F and heating means 6) connected through opening and closing bulbs V1 G, V2 G, V3 G,... to general feeding parts 10 of raw materials (composed of a carrier gas resource 2, an organometal resource 1 and a raw gas resource 4). Thereby, the crystalline growths on plural base plates 30 on which crystals are grown from vapor can be performed by the vapor grow apparatus with a simple constitution in good operability, and thereby improvement of mass-productiveness and lowering of a installation cost become possible.
Information query
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