Alignment system and alignment marks for use therewith cross-reference to related applications.

Invention Patent

NL1036351A1 Alignment system and alignment marks for use therewith cross-reference to related applications. 未知

Patent Title: Alignment system and alignment marks for use therewith cross-reference to related applications.
Application No.: NL1036351

Application Date: 2008-12-22
Publication No.: NL1036351A1

Publication Date: 2009-07-01
Inventor: HULSEBOS EDO MARIA , BIJNEN FRANCISCUS GODEFRIDUS CASPER , WARNAAR PATRICK
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US1802507 2007-12-31
Main IPC: G03F9/00
IPC: G03F9/00 ; G03F7/20 ; H01L21/68

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F9/00	原版、蒙片、片框、照片、图纹表面的对准或定位，例如自动地（G03F7/22优先；照相蒙片的制备入G03F1/00；在复制用的照相印片设备中的入G03B27/00）