Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.

Invention Patent

NL1036618A1 Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system. 未知

Patent Title: Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.
Application No.: NL1036618

Application Date: 2009-02-24
Publication No.: NL1036618A1

Publication Date: 2009-09-25
Inventor: EUSSEN EMIEL JOZEF MELANIE , PASCH ENGELBERTUS ANTONIUS FRANSISCUS VAN DER , LEEUWEN ROBERT EDGAR VAN , KLAVER RENATUS GERARDUS , HAMERS MARTIJN ROBERT
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US6472708 2008-03-24
Main IPC: G03F7/20
IPC: G03F7/20

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）