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    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明公开
    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    位移测量系统平台设备和设备制造方法

    公开(公告)号：KR20070095805A

    公开(公告)日：2007-10-01

    申请号：KR20070027566

    申请日：2007-03-21

    Applicant: ASML NETHERLANDS BV

    Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/02 ,  G01B9/02 ,  G03F7/20

    CPC classification number: G01D5/38 ,  G03F7/70775

    Abstract: A displacement measuring system, a lithography device, and a manufacturing method thereof are provided to reduce sensitivity against an error and to decrease an installation space thereof. A displacement measuring system comprises first and second diffraction lattices, a sensor(216), and at least one linear polarizer(217,218). The first diffraction lattice is used to divide a first beam of inputted radiation into first positive and negative diffraction radiation beams(212,213). The first positive and negative diffraction radiation beams are diffracted more by the second diffraction lattice. The sensor is used to decide a relative displacement between the first and second diffraction lattices from a decision of a phase difference between a first component of the second beam deduced from the first positive diffraction radiation beam, and a second component of the second beam deduced from the first negative diffraction radiation beam. The linear polarizer is formed to diffract the first and second components of the second beam linearly and to position and cross the first and second components mutually. A lithography device is used to detect the displacement of the first component thereof against the second component thereof.

    Abstract translation: 提供了位移测量系统，光刻设备及其制造方法，以降低对错误的灵敏度并减小其安装空间。 位移测量系统包括第一和第二衍射栅格，传感器（216）和至少一个线性偏振器（217,218）。 第一衍射栅格用于将第一射入的辐射束分成第一正和负衍射辐射束（212,213）。 第一正和负衍射辐射束被第二衍射晶格衍射更多。 该传感器用于根据从第一正衍射辐射束推断的第二光束的第一分量与从第一正衍射辐射束推导出的第二光束的第二分量之间的相位差的判定来确定第一和第二衍射光栅之间的相对位移 第一个负衍射辐射束。 线性偏振器被形成为线性地衍射第二光束的第一和第二分量并相互定位和交叉第一和第二分量。 光刻装置用于检测其第一部件相对于其第二部件的位移。

    Encoder-type measurement system, lithographic apparatus, and method of detecting error on or in grid or grating of encoder-type measurement system
    2.
    发明专利
    Encoder-type measurement system, lithographic apparatus, and method of detecting error on or in grid or grating of encoder-type measurement system 有权
    编码器类型测量系统，光刻设备和检测编码器类型测量系统或网格中的错误或方法

    公开(公告)号：JP2009231835A

    公开(公告)日：2009-10-08

    申请号：JP2009063815

    申请日：2009-03-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO ,  ROBBERT EDGAR VAN LEEUWEN ,  KLAVER RENATUS GERARDUS ,  HAMELS MARTIJN ROBERT

    IPC: H01L21/027

    CPC classification number: G03B27/54 ,  G01D5/24461 ,  G01D5/347 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a position measurement which reduces the risk of erroneous positioning of a movable object due to errors in a grid or grating.
    SOLUTION: An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种位置测量，其减少由于格栅或光栅中的错误而导致可移动物体错误定位的风险。 解决方案：编码器型测量系统被配置为测量可移动物体的位置相关信号。 测量系统包括光源和传感器。 光源和传感器安装在可移动物体之一或基本上固定的框架上。 测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。 光源被配置为朝向参考对象发射光束。 传感器被配置为检测由参考对象反射的光源的光。 该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。 版权所有（C）2010，JPO＆INPIT

    Displacement measuring system, lithographic apparatus, and device manufacturing method
    4.
    发明专利
    Displacement measuring system, lithographic apparatus, and device manufacturing method 有权
    位移测量系统，平面设备和设备制造方法

    公开(公告)号：JP2007292735A

    公开(公告)日：2007-11-08

    申请号：JP2007064291

    申请日：2007-03-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G01D5/38 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide an improved precision measuring system hardly causing error, without requiring excessive space. SOLUTION: This system is designed so that a 1st radiant beam input in the measuring system is partitioned into a primary diffraction beam and negative primary diffraction beam by 1st grating, the primary diffraction beam and negative primary diffraction beam are further diffracted by 2nd grating, and then recombined to form a 2nd radiant beam. Additionally, this measuring system determines relative displacement of both the 1st and 2nd gratings based on determination of phase difference between the 1st component of 2nd beam derived from the primary diffraction radiant beam and the 2nd component of 2nd beam derived from the negative primary diffraction radiant beam. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供几乎不引起误差的改进的精密测量系统，而不需要太多的空间。 解决方案：该系统设计使得测量系统中的第一个辐射束输入通过第一个光栅分为初级衍射光束和负一次衍射光束，主衍射光束和负一次衍射光束进一步被第二次衍射 光栅，然后重组以形成第二辐射束。 另外，该测量系统基于从主衍射辐射束得到的第二光束的第一分量与从负的主衍射辐射束得到的第二光束的第二分量之间的相位差的确定来确定第一和第二光栅的相对位移 。 版权所有（C）2008，JPO＆INPIT

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