Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.

Invention Patent

NL1036772A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. 未知

Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
Application No.: NL1036772

Application Date: 2009-03-26
Publication No.: NL1036772A1

Publication Date: 2009-10-19
Inventor: KERKHOF MARCUS ADRIANUS VAN DE , KIERS ANTOINE GASTON MARIE , SCHAAR MAURITS VAN DER , VERSTAPPEN LEONARDUS HENRICUS , MIDDLEBROOKS SCOTT ANDERSON , FUCHS ANDREAS
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US7115508 2008-04-15
Main IPC: G03F7/20
IPC: G03F7/20 ; G01N21/47

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Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）