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    Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method
    1.
    发明专利
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method 审中-公开
    检查方法和装置，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：JP2008139303A

    公开(公告)日：2008-06-19

    申请号：JP2007296182

    申请日：2007-11-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VERSTAPPEN LEONARDUS HENRICUS ,  KIERS ANTOINE GASTON MARIE ,  NAUMOSKI GOCE

    IPC: G01B11/24 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G03F7/70625

    Abstract: PROBLEM TO BE SOLVED: To provide an inspection apparatus, a lithographic apparatus, and the like each of which, when measuring the profile of an object that is printed on top of a stack of product layers, can minimize or eliminate the number of degrees of freedom brought into the reconstruction equation by any product layers. SOLUTION: To prevent an unknown parameters of one or more product layers having an effect on the measurement of the object profile, the thickness of the one or more product layers is measured prior to measuring the profile of the scatterometry object on the layer(s). In an embodiment, each of a plurality of product layers is measured as it is exposed so that only the degree of freedom of the most recently exposed product layer is unknown at each measurement step. After each of a plurality of product layers has been measured with a scatterometry object placed at the top of the layers, only the degrees of freedom of that scatterometry object should be unknown and only the profile of the object should need to be measured. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种检查装置，光刻设备等，当测量印刷在产品层叠层上面的物体的轮廓时，可以最小化或消除数量 通过任何产品层带入重建方程的自由度。

    解决方案：为了防止影响对象轮廓测量的一个或多个产品层的未知参数，在测量层之间的散射对象的轮廓之前测量一个或多个产品层的厚度 （S）。 在一个实施例中，多个产品层中的每一个在被暴露时被测量，使得在每个测量步骤中仅最近曝光的产品层的自由度是未知的。 在放置在层顶部的散射对象物体测量了多个产品层中的每一个之后，只有该散射测量对象的自由度应该是未知的，并且只需要测量对象的轮廓。 版权所有（C）2008，JPO＆INPIT

    Method of manufacturing device and computer program product
    2.
    发明专利
    Method of manufacturing device and computer program product 有权
    制造设备和计算机程序产品的方法

    公开(公告)号：JP2007173807A

    公开(公告)日：2007-07-05

    申请号：JP2006336454

    申请日：2006-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VERSTAPPEN LEONARDUS HENRICUS ,  MOS EVERHARDUS CORNELIS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70466 ,  G03F7/70558 ,  G03F7/70625

    Abstract: PROBLEM TO BE SOLVED: To solve the problem that widths of a characteristic form printed at two exposure steps differ in double exposure. SOLUTION: This method of manufacturing a device includes a step of printing the characteristic form of a primary set on the target portion of a substrate, a step of measuring the minimum dimension of the characteristic form of the primary set, a step of calculating setting to the print process for the second printing characteristic form set on the target portion in the minimum dimension coincident at a minimum dimension by which the characteristic form of the primary set has been measured, and a step of printing the characteristic form of the second set which is interleaved with the characteristic form of the primary set by using the calculated setting. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了解决在两次曝光步骤中印刷的特征形式的宽度在双重曝光中不同的问题。 解决方案：该制造装置的方法包括在基板的目标部分上印刷初级组的特征形式的步骤，测量初级组的特征形式的最小尺寸的步骤，步骤 计算设置在目标部分上的第二打印特征形式的打印处理的设置，该最小尺寸在已经测量了初级集合的特征形式的最小尺寸上重合，以及打印第二打印特征形式的特征形式的步骤 通过使用计算的设置与主组的特征形式交错。 版权所有（C）2007，JPO＆INPIT

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