- Patent Title: Monolayer of nanorods on a substrate and method of forming the same
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Application No.: US14773195Application Date: 2014-03-05
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Publication No.: US10041886B2Publication Date: 2018-08-07
- Inventor: Qihua Xiong , Bo Peng
- Applicant: NANYANG TECHNOLOGICAL UNIVERSITY
- Applicant Address: SG Singapore
- Assignee: Nanyang Technological University
- Current Assignee: Nanyang Technological University
- Current Assignee Address: SG Singapore
- Agency: Alston & Bird LLP
- International Application: PCT/SG2014/000107 WO 20140305
- International Announcement: WO2014/137292 WO 20140912
- Main IPC: B05D3/04
- IPC: B05D3/04 ; B05D3/06 ; G01N21/65 ; B81C1/00 ; B82Y40/00 ; B82Y30/00 ; B82Y20/00

Abstract:
Provided is a method of forming a monolayer of nanorods on a substrate, wherein the nanorods are at least substantially vertically aligned, the method including providing a droplet of a solution including the nanorods on a substrate, and controlling the temperature and the evaporation of the solution such that the internal region of the droplet is kept at near equilibrium status to allow formation of the monolayer of nanorods. Also provided is a monolayer of nanorods on the substrate thus obtained. Also provided is an optical arrangement and use of the optical arrangement.
Public/Granted literature
- US20160018335A1 MONOLAYER OF NANORODS ON A SUBSTRATE AND METHOD OF FORMING THE SAME Public/Granted day:2016-01-21
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