Invention Grant
- Patent Title: Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus
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Application No.: US15431098Application Date: 2017-02-13
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Publication No.: US10109451B2Publication Date: 2018-10-23
- Inventor: Georg Jost , Ludwig Ledl , Bernhard G. Mueller , George Tzeng
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/02 ; H01J37/18 ; H01J37/26
Abstract:
A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.
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