公开(公告)号：US10109451B2

公开(公告)日：2018-10-23

申请号：US15431098

申请日：2017-02-13

Applicant: Applied Materials, Inc.

Inventor： Georg Jost ,  Ludwig Ledl ,  Bernhard G. Mueller ,  George Tzeng

IPC: H01J37/00 ,  H01J37/02 ,  H01J37/18 ,  H01J37/26

Abstract: A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.