Invention Grant
- Patent Title: Endpointing for focused ion beam processing
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Application No.: US14766953Application Date: 2012-07-16
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Publication No.: US10204762B2Publication Date: 2019-02-12
- Inventor: Scott Edward Fuller , Jason Donald , Termsupt Seemuntchaiboworn
- Applicant: Scott Edward Fuller , Jason Donald , Termsupt Seemuntchaiboworn
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, P.C.
- Agent Michael O. Scheinberg
- International Application: PCT/US2012/046975 WO 20120716
- International Announcement: WO2014/014446 WO 20140123
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/304 ; H01J37/22 ; H01J37/28 ; H01J37/30 ; H01J37/305
Abstract:
To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.
Public/Granted literature
- US20160126060A1 ENDPOINTING FOR FOCUSED ION BEAM PROCESSING Public/Granted day:2016-05-05
Information query
