Invention Grant
- Patent Title: Block polymers for sub-10 nm patterning
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Application No.: US15439604Application Date: 2017-02-22
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Publication No.: US10239982B2Publication Date: 2019-03-26
- Inventor: Carlton Grant Willson , Gregory Blachut , Michael Maher , Yusuke Asano , Christopher John Ellison
- Applicant: Board of Regents The University of Texas System
- Applicant Address: US TX Austin
- Assignee: Board of Regents The University of Texas System
- Current Assignee: Board of Regents The University of Texas System
- Current Assignee Address: US TX Austin
- Agency: Medlen & Carroll, LLP
- Main IPC: C08F297/00
- IPC: C08F297/00 ; B32B5/16 ; B05D3/10 ; B05D7/26 ; B05D7/00 ; C09D153/00 ; G03F7/00 ; H01L21/027 ; B82Y40/00
Abstract:
The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
Public/Granted literature
- US20170240681A1 Block Polymers for Sub-10 NM Patterning Public/Granted day:2017-08-24
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