Invention Grant
- Patent Title: Charged particle beam writing apparatus, and charged particle beam writing method
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Application No.: US15789276Application Date: 2017-10-20
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Publication No.: US10283314B2Publication Date: 2019-05-07
- Inventor: Rieko Nishimura
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Kanagawa
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Kanagawa
- Agency: Cermak Nakajima & McGowan LLP
- Agent Tomoko Nakajima
- Priority: JP2016-211750 20161028
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/304 ; H01J37/317

Abstract:
A charged particle beam writing apparatus includes a number of shots calculation circuit to calculate the number of shots in the case where a deflection region is irradiated with a shot of a charged particle beam, a deflection position correcting circuit to correct a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region, and a deflector to deflect the charged particle beam to a corrected deflected position on the target object.
Public/Granted literature
- US20180122616A1 Charged Particle Beam Writing Apparatus, and Charged Particle Beam Writing Method Public/Granted day:2018-05-03
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