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    Settling time acquisition method
    4.
    发明授权
    Settling time acquisition method 有权
    建立时间获取方法

    公开(公告)号：US08872139B2

    公开(公告)日：2014-10-28

    申请号：US14211782

    申请日：2014-03-14

    Applicant: NuFlare Technology, Inc.

    Inventor： Rieko Nishimura ,  Michihiro Sakai

    IPC: H01J37/00 ,  H01J37/147 ,  H01J37/304 ,  G21K5/10 ,  H01J37/317

    CPC classification number: H01J37/3174 ,  H01J2237/31754 ,  H01J2237/31776 ,  H01J2237/31798

    Abstract: A settling time acquisition method includes writing at least one reference pattern formed by at least one shot of a charged particle beam, writing an evaluation pattern, which has been formed by combination of the first and second shots of a charged particle beam shaped to first and second patterns of different sizes and whose width size is the same as that of the reference pattern, while changing, concerning beam shaping of the second shot, a settling time of a DAC amplifier, wherein writing is performed for each settling time, measuring the width size of the reference pattern, measuring the width size of the evaluation pattern for each settling time, calculating, for each settling time, a difference between the width sizes of the reference and evaluation patterns, and acquiring a settling time from each settling time of the DAC amplifier when the difference is not exceeding a threshold value.

    Abstract translation: 建立时间获取方法包括写入由带电粒子束的至少一个照片形成的至少一个参考图案，写入评估图案，该评估图案是通过将第一和第二次投射的第一和第二次投射组合形成的， 不同尺寸的第二图案和其宽度尺寸与参考图案的尺寸相同，同时关于第二镜头的光束整形改变DAC放大器的建立时间，其中对每个建立时间进行写入，测量宽度 参考图案的尺寸，测量每个建立时间的评估图案的宽度尺寸，针对每个建立时间计算参考和评估图案的宽度尺寸之间的差异，以及从每个建立时间的每个建立时间获取建立时间 DAC放大器当差值不超过阈值时。

    METHOD FOR ACQUIRING SETTLING TIME
    5.
    发明申请
    METHOD FOR ACQUIRING SETTLING TIME 有权
    获取结算时间的方法

    公开(公告)号：US20140054469A1

    公开(公告)日：2014-02-27

    申请号：US13940477

    申请日：2013-07-12

    Applicant: NuFlare Technology, Inc.

    Inventor： Rieko Nishimura

    IPC: H01J37/317

    CPC classification number: H01J37/3045 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/30483

    Abstract: A method for acquiring a settling time according to an embodiment, includes writing a plurality of first patterns, arranged in positions apart from each other by a deflection movement amount, by using a DAC amplifier in which a settling time of the DAC amplifier is set to a first time to be a sufficient settling time; writing a plurality of second patterns, in a manner where corresponding first and second patterns are in a position adjacent, for each second time of different second times containing the sufficient settling time set as variable; measuring a width dimension of each of a plurality of combined patterns after adjacent first and second patterns are combined for the each second time set as variable; and acquiring the settling time of the DAC amplifier needed for deflection by the deflection movement amount, using the width dimensions.

    Abstract translation: 根据实施例的用于获取建立时间的方法包括通过使用其中DAC放大器的建立时间被设置为的DAC放大器来写入布置在彼此偏离偏移移动量的位置的多个第一图案 第一次成为一个足够的安顿时间; 以对应的第一和第二图案位于相邻的位置的方式，以不同的第二次的每个第二次的方式写入多个第二图案，其中包含设定为可变的足够的建立时间; 测量在相邻的第一和第二图案之后的多个组合图案中的每一个的宽度尺寸被组合以设置为变量的每个第二时间; 并且使用宽度尺寸获取偏转移动量所需的DAC放大器的建立时间。

    Evaluation method, correction method, recording medium and electron beam lithography system
    6.
    发明授权
    Evaluation method, correction method, recording medium and electron beam lithography system 有权

    公开(公告)号：US10483082B2

    公开(公告)日：2019-11-19

    申请号：US15978747

    申请日：2018-05-14

    Applicant: NuFlare Technology, Inc.

    Inventor： Rieko Nishimura

    IPC: H01J37/22 ,  H01J37/09 ,  H01J37/317 ,  H01J37/304

    Abstract: An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.

    ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD
    7.
    发明申请
    ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD 有权
    充电颗粒光束绘图装置和充电颗粒光束绘图方法的调整方法

    公开(公告)号：US20170011884A1

    公开(公告)日：2017-01-12

    申请号：US15188007

    申请日：2016-06-21

    Applicant: NuFlare Technology, Inc.

    Inventor： Takashi NAKAMURA ,  Rieko Nishimura

    IPC: H01J37/30 ,  H01J37/20 ,  H01J37/317

    CPC classification number: H01J37/3005 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/30477

    Abstract: According to one embodiment, a method of adjusting a charged particle beam drawing apparatus includes obtaining an offset amount in beam size to be set in the charged particle beam drawing apparatus. The method includes forming a linear evaluation pattern on a substrate by changing number of divisions of a beam with a predetermined size and performing drawing by using divided beams, obtaining a change amount in a line width of the evaluation pattern from a design dimension for each number of divisions, and calculating the offset amount by fitting a model function to the change amount for each number of divisions, the model function being obtained by modeling a pattern line width based on a distribution of energy given by charged particle beams.

    Abstract translation: 根据一个实施例，一种调整带电粒子束描绘装置的方法包括：获得待设置在带电粒子束描绘装置中的束尺寸的偏移量。 该方法包括通过改变具有预定尺寸的光束的分割数来在衬底上形成线性评估图案，并通过使用划分的光束进行绘制，从每个数字的设计尺寸获得评估图案的线宽的变化量 并且通过将模型函数拟合到每个分割数的变化量来计算偏移量，所述模型函数通过基于由带电粒子束给出的能量分布对图案线宽进行建模而获得。

    Position correction method of stage mechanism and charged particle beam lithography apparatus
    9.
    发明授权
    Position correction method of stage mechanism and charged particle beam lithography apparatus 有权

    公开(公告)号：US10345724B2

    公开(公告)日：2019-07-09

    申请号：US15834351

    申请日：2017-12-07

    Applicant: NUFLARE TECHNOLOGY, INC.

    Inventor： Rieko Nishimura ,  Hidekazu Takekoshi

    IPC: G03B27/42 ,  G03F9/00 ,  G03F7/20 ,  G01B9/02 ,  G03F1/78 ,  H01J37/317

    Abstract: According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.

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