Invention Grant
- Patent Title: Substrate table, lithographic apparatus and method of operating a lithographic apparatus
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Application No.: US15781813Application Date: 2016-11-02
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Publication No.: US10317804B2Publication Date: 2019-06-11
- Inventor: Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP15198441 20151208
- International Application: PCT/EP2016/076352 WO 20161102
- International Announcement: WO2017/097502 WO 20170615
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
Public/Granted literature
- US20180364584A1 SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS Public/Granted day:2018-12-20
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