- Patent Title: Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
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Application No.: US15509662Application Date: 2015-09-08
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Publication No.: US10392699B2Publication Date: 2019-08-27
- Inventor: Hitoshi Hamaguchi , Kenrou Tanaka , Kenzou Ookita , Keisuke Kuriyama
- Applicant: JSR CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-186567 20140912
- International Application: PCT/JP2015/075441 WO 20150908
- International Announcement: WO2016/039327 WO 20160317
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H05K3/00 ; G03F7/20 ; B05D3/06 ; B29C59/16 ; C08J7/00 ; G03F7/039 ; C09D129/10 ; C09D133/10 ; C09D133/14 ; C09D133/16 ; C23C16/56 ; H05K3/12 ; G03F7/004 ; G03F7/18 ; G03F7/24

Abstract:
The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.
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