Invention Grant
- Patent Title: Methods and apparatus for high throughput SEM and AFM for characterization of nanostructured surfaces
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Application No.: US15974176Application Date: 2018-05-08
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Publication No.: US10438772B2Publication Date: 2019-10-08
- Inventor: Vijay Varadan , Pratyush Rai , Gyanesh Mathur
- Applicant: NANOWEAR INC.
- Applicant Address: US NY Brooklyn
- Assignee: NANOWEAR INC.
- Current Assignee: NANOWEAR INC.
- Current Assignee Address: US NY Brooklyn
- Agency: Davidson, Davidson & Kappel, LLC
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/20 ; G01Q60/42 ; G01Q30/02 ; G01Q30/04 ; B82Y35/00 ; G01Q60/30

Abstract:
A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.
Public/Granted literature
- US20180330918A1 METHODS AND APPARATUS FOR HIGH THROUGHPUT SEM AND AFM FOR CHARACTERIZATION OF NANOSTRUCTURED SURFACES Public/Granted day:2018-11-15
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