Invention Grant
- Patent Title: Selective deposition of metals, metal oxides, and dielectrics
-
Application No.: US15877632Application Date: 2018-01-23
-
Publication No.: US10456808B2Publication Date: 2019-10-29
- Inventor: Suvi P. Haukka , Raija H. Matero , Eva Tois , Antti Niskanen , Marko Tuominen , Hannu Huotari , Viljami J. Pore , Ivo Raaijmakers
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: C23C16/40
- IPC: C23C16/40 ; B05D3/10 ; C23C18/06 ; C23C18/12 ; C23C16/02 ; C23C16/04 ; C23C16/14 ; C23C16/18 ; C23C16/28
Abstract:
Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.
Public/Granted literature
- US20180243787A1 SELECTIVE DEPOSITION OF METALS, METAL OXIDES, AND DIELECTRICS Public/Granted day:2018-08-30
Information query
IPC分类:
