Invention Grant
- Patent Title: Method for forming regular polymer thin films using atmospheric plasma deposition
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Application No.: US15307924Application Date: 2015-05-06
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Publication No.: US10471465B2Publication Date: 2019-11-12
- Inventor: Nicolas Boscher , Patrick Choquet , David Duday , Florian Hilt
- Applicant: Luxembourg Institute of Science and Technology (LIST)
- Applicant Address: LU Esch/Alzette
- Assignee: Luxembourg Institute of Science and Technology (LIST)
- Current Assignee: Luxembourg Institute of Science and Technology (LIST)
- Current Assignee Address: LU Esch/Alzette
- Agent James E. Walton
- Priority: LU92445 20140507
- International Application: PCT/EP2015/059979 WO 20150506
- International Announcement: WO2015/169864 WO 20151112
- Main IPC: B05D1/00
- IPC: B05D1/00 ; B05D3/04 ; H01J37/32
Abstract:
The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
Public/Granted literature
- US20170050214A1 Method for Forming Regular Polymer Thin Films Using Atmospheric Plasma Deposition Public/Granted day:2017-02-23
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