Invention Grant
- Patent Title: Laminated film and process for manufacturing the same
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Application No.: US15471734Application Date: 2017-03-28
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Publication No.: US10535838B2Publication Date: 2020-01-14
- Inventor: Yutaka Ito
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2016-070410 20160331
- Main IPC: H01L51/52
- IPC: H01L51/52 ; B05D3/06 ; C23C16/40 ; B05D1/00 ; C23C16/02 ; C23C16/30 ; C23C16/36 ; C23C16/509 ; C23C16/54 ; C23C16/56 ; H01L51/00

Abstract:
A laminated film containing at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, wherein concerning a distance from a surface of the inorganic polymer layer in a film thickness direction of the layer and the ratio of an oxygen atom to a total amount of a silicon atom, an oxygen atom, a carbon atom and a nitrogen atom, the ratio of a value of the oxygen atomic ratio in a region from a surface on a side opposite to the gas barrier layer up to 30% of a film thickness of the inorganic polymer layer in a depth direction to a value of the oxygen atomic ratio in a region from 30% of a film thickness of the inorganic polymer layer in a depth direction up to a surface on a side of the gas barrier layer is 1.05 or more.
Public/Granted literature
- US20170288170A1 LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME Public/Granted day:2017-10-05
Information query
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