Invention Grant
- Patent Title: Electron source and production method therefor
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Application No.: US16317640Application Date: 2017-06-29
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Publication No.: US10553390B2Publication Date: 2020-02-04
- Inventor: Toshiyuki Morishita , Hiromitsu Chatani , Shimpei Hirokawa , Toshiyuki Ibayashi , Isao Sugimoto
- Applicant: DENKA COMPANY LIMITED
- Applicant Address: JP Tokyo
- Assignee: Denka Company Limited
- Current Assignee: Denka Company Limited
- Current Assignee Address: JP Tokyo
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Priority: JP2016-141785 20160719; JP2017-063016 20170328
- International Application: PCT/JP2017/023933 WO 20170629
- International Announcement: WO2018/016286 WO 20180125
- Main IPC: H01J37/06
- IPC: H01J37/06 ; H01J1/148 ; H01J9/04
Abstract:
An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.
Public/Granted literature
- US20190221399A1 ELECTRON SOURCE AND PRODUCTION METHOD THEREFOR Public/Granted day:2019-07-18
Information query
