Devices, methods, and systems for trapping multiple ions are described herein. One device includes two or more ovens wherein each oven includes a heating element and a cavity for emitting atoms of a particular atomic species from an atomic source substance, a substrate having a number of apertures that allow atoms emitted from the atomic source substance to exit the oven and enter an ion trapping area and wherein each oven is positioned at a different ion loading area within the ion trapping area, and a plurality of electrodes that can be charged and wherein the charge can be used to selectively control the movement of a particular ion from a particular loading area to a particular ion trap location.