Invention Grant
- Patent Title: Non-contact measurement of a stress in a film on a substrate
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Application No.: US15722645Application Date: 2017-10-02
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Publication No.: US10553623B2Publication Date: 2020-02-04
- Inventor: Wojciech Jan Walecki , Oanh Nguyen
- Applicant: Applejack 199 L.P.
- Applicant Address: US CA Milpitas
- Assignee: APPLEJACK 199 L.P.
- Current Assignee: APPLEJACK 199 L.P.
- Current Assignee Address: US CA Milpitas
- Agency: Maschoff Brennan
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G01B11/30 ; G01B11/24 ; G01B11/16 ; G01M11/08 ; G01L1/24 ; H01L21/66

Abstract:
A method for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include measuring first topography data of a substrate having a thin-film deposited thereupon. The method may also include comparing the first topography data with second topography data of the substrate that is measured prior to thin-film deposition. The method may further include obtaining a vertical displacement of the substrate based on the comparison between the first topography data and the second topography data. The method may also include detecting a stress value in the thin-film deposited on the substrate based on a fourth-order polynomial equation and the vertical displacement.
Public/Granted literature
- US20180308971A1 NON-CONTACT MEASUREMENT OF A STRESS IN A FILM ON A SUBSTRATE Public/Granted day:2018-10-25
Information query
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