Invention Grant
- Patent Title: Scanning electron microscope
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Application No.: US16115287Application Date: 2018-08-28
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Publication No.: US10559450B2Publication Date: 2020-02-11
- Inventor: Noritsugu Takahashi , Yasunari Sohda , Akira Ikegami , Yuta Kawamoto
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- Priority: JP2017-168435 20170901
- Main IPC: H01J37/141
- IPC: H01J37/141 ; H01J37/04 ; H01J37/28 ; H01J37/244 ; H01J37/147

Abstract:
The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.
Public/Granted literature
- US20190074159A1 SCANNING ELECTRON MICROSCOPE Public/Granted day:2019-03-07
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