Invention Grant
- Patent Title: Particle beam system
-
Application No.: US16196081Application Date: 2018-11-20
-
Publication No.: US10600613B2Publication Date: 2020-03-24
- Inventor: Dirk Zeidler , Thomas Kemen , Christof Riedesel , Ralf Lenke
- Applicant: Carl Zeiss Microscopy GmbH
- Applicant Address: DE Jena
- Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee Address: DE Jena
- Agency: Fish & Richardson P.C.
- Priority: DE102014008083 20140530
- Main IPC: H01J37/10
- IPC: H01J37/10 ; H01J37/09 ; H01J37/12 ; H01J37/28 ; H01J37/26 ; H01J37/24

Abstract:
Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.
Public/Granted literature
- US20190088440A1 PARTICLE BEAM SYSTEM Public/Granted day:2019-03-21
Information query