- Patent Title: Method and apparatus for temperature and voltage management control
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Application No.: US15274697Application Date: 2016-09-23
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Publication No.: US10649514B2Publication Date: 2020-05-12
- Inventor: Wei Huang , Yazhou Zu , Indrani Paul
- Applicant: Advanced Micro Devices, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Faegre Baker Daniels LLP
- Main IPC: G06F1/00
- IPC: G06F1/00 ; G06F1/28

Abstract:
A method and apparatus for managing processing power determine a supply voltage to supply to a processing unit, such as a central processing unit (CPU) or graphics processing unit (GPU), based on temperature inversion based voltage, frequency, temperature (VFT) data. The temperature inversion based VFT data includes supply voltages and corresponding operating temperatures that cause the processing unit's transistors to operate in a temperature inversion region. In one example, the temperature inversion based VFT data includes lower supply voltages and corresponding higher temperatures in a temperature inversion region of a processing unit. The temperature inversion based VFT data is based on an operating frequency of the processing unit. The apparatus and method adjust a supply voltage to the processing unit based on the temperature inversion based VFT data.
Public/Granted literature
- US20180088606A1 METHOD AND APPARATUS FOR TEMPERATURE AND VOLTAGE MANAGEMENT CONTROL Public/Granted day:2018-03-29
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