Invention Grant
- Patent Title: Electron beam image acquisition apparatus, and electron beam image acquisition method
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Application No.: US16132618Application Date: 2018-09-17
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Publication No.: US10665422B2Publication Date: 2020-05-26
- Inventor: Hidekazu Takekoshi
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Kanagawa
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Kanagawa
- Agency: Cermak Nakajima & McGowan LLP
- Agent Tomoko Nakajima
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@720e4f63
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G06T7/00 ; H01J37/22 ; H01J37/28

Abstract:
An electron beam image acquisition apparatus includes a deflector to deflect an electron beam, a deflection control system to control the deflector, a measurement circuitry to measure, while moving a stage for placing thereon a substrate on which a figure pattern is formed, an edge position of a mark pattern arranged on the stage by scanning the mark pattern with an electron beam, a delay time calculation circuitry to calculate, using information on the edge position, a deflection control delay time which is a delay time to start deflection control occurring in the deflection control system, a correction circuitry to correct, using the deflection control delay time, a deflection position of the electron beam, and an image acquisition mechanism to include the deflector and acquire an image of the figure pattern at a corrected deflection position on the substrate.
Public/Granted literature
- US20190096631A1 Electron Beam Image Acquisition Apparatus, and Electron Beam Image Acquisition Method Public/Granted day:2019-03-28
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