Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16182919Application Date: 2018-11-07
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Publication No.: US10693038B2Publication Date: 2020-06-23
- Inventor: Huan-Yu Lai , Li-Chi Peng
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR Corporation
- Current Assignee: EPISTAR Corporation
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L33/14
- IPC: H01L33/14 ; H01L33/32 ; H01L33/06 ; H01L33/30 ; H01L33/00 ; H01L33/04

Abstract:
A semiconductor device is provided. The semiconductor device includes a first semiconductor layer; a second semiconductor layer on the first semiconductor layer; an active region between the second semiconductor layer and the first semiconductor layer; an electron blocking structure on the active region; a first In-containing layer between the active region and the electron blocking structure; and a second In-containing layer on the electron blocking structure; wherein the first In-containing layer has a first indium content, the second In-containing layer has a second indium content, and the second indium content is different from the first indium content.
Public/Granted literature
- US20190157510A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-05-23
Information query
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