Invention Grant
- Patent Title: Charged particle beam device and capturing condition adjusting method in charged particle beam device
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Application No.: US16436297Application Date: 2019-06-10
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Publication No.: US10770266B2Publication Date: 2020-09-08
- Inventor: Tomohito Nakano , Toshiyuki Yokosuka , Yuko Sasaki , Minoru Yamazaki , Yuzuru Mochizuki
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@11c42ef5
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/147 ; G01N23/225

Abstract:
A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
Public/Granted literature
- US20200035449A1 Charged Particle Beam Device and Capturing Condition Adjusting Method in Charged Particle Beam Device Public/Granted day:2020-01-30
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