Invention Grant
- Patent Title: Ion implanter and method of controlling ion implanter
-
Application No.: US16197523Application Date: 2018-11-21
-
Publication No.: US10854418B2Publication Date: 2020-12-01
- Inventor: Haruka Sasaki
- Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Current Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Priority: JP2017-225034 20171122
- Main IPC: H01J37/05
- IPC: H01J37/05 ; H01J37/317 ; H01J37/147 ; H01J37/08 ; H01J37/141 ; H01J49/30

Abstract:
A mass analyzer includes a mass analyzing magnet that applies a magnetic field to ions extracted from an ion source to deflect the ions, a mass analyzing slit that is provided downstream of the mass analyzing magnet and allows an ion of a desired ion species among the deflected ions to selectively pass, and a lens device that is provided between the mass analyzing magnet and the mass analyzing slit and applies a magnetic field and/or an electric field to the ion beam to adjust the convergence or divergence of a ion beam. The mass analyzer changes a focal point of the ion beam in a predetermined adjustable range between an upstream side and a downstream side of the mass analyzing slit with the lens device to adjust mass resolution.
Public/Granted literature
- US20190157035A1 ION IMPLANTER AND METHOD OF CONTROLLING ION IMPLANTER Public/Granted day:2019-05-23
Information query