Invention Grant
- Patent Title: Electrostatic filter and ion implanter having asymmetric electrostatic configuration
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Application No.: US16197251Application Date: 2018-11-20
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Publication No.: US10886098B2Publication Date: 2021-01-05
- Inventor: Alexandre Likhanskii , Frank Sinclair , Shengwu Chang , Eric D. Hermanson , Nevin H. Clay
- Applicant: APPLIED Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED Materials, Inc.
- Current Assignee: APPLIED Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kacvinsky Daisak Bluni PLLC
- Main IPC: H01J37/05
- IPC: H01J37/05 ; H01J37/12 ; H01J37/08 ; H01J37/147 ; H01J37/317

Abstract:
An apparatus may include a main chamber, an entrance tunnel, having an entrance axis extending into the main chamber, and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, on a lower side of the exit tunnel; and a catch assembly, disposed within the main chamber, in a line of sight from an exterior aperture of the exit tunnel.
Public/Granted literature
- US20200161077A1 ELECTROSTATIC FILTER AND ION IMPLANTER HAVING ASYMMETRIC ELECTROSTATIC CONFIGURATION Public/Granted day:2020-05-21
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