Invention Grant
- Patent Title: Substrate holder, a lithographic apparatus and method of manufacturing devices
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Application No.: US15779804Application Date: 2016-11-02
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Publication No.: US10895808B2Publication Date: 2021-01-19
- Inventor: Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP15200143 20151215
- International Application: PCT/EP2016/076357 WO 20161102
- International Announcement: WO2017/102162 WO 20170622
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027 ; H01L21/687
Abstract:
A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
Public/Granted literature
- US20200183287A1 A SUBSTRATE HOLDER, A LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICES Public/Granted day:2020-06-11
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