Invention Grant
- Patent Title: Photosensitive composition, colored pattern and method for producing same
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Application No.: US16337470Application Date: 2017-09-21
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Publication No.: US10976663B2Publication Date: 2021-04-13
- Inventor: Hirofumi Inari , Susumu Amano , Aki Kitajima , Yoshikatsu Ichiryu , Masahito Ide , Takao Manabe
- Applicant: KANEKA CORPORATION
- Applicant Address: JP Osaka
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2016-191557 20160929
- International Application: PCT/JP2017/034150 WO 20170921
- International Announcement: WO2018/061988 WO 20180405
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/004 ; G03F7/038 ; C08G77/388 ; G02B5/20 ; C08G59/20

Abstract:
A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
Public/Granted literature
- US20190235383A1 PHOTOSENSITIVE COMPOSITION, COLORED PATTERN AND METHOD FOR PRODUCING SAME Public/Granted day:2019-08-01
Information query
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