Invention Grant
- Patent Title: Multiple electron beams irradiation apparatus
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Application No.: US16809611Application Date: 2020-03-05
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Publication No.: US11139138B2Publication Date: 2021-10-05
- Inventor: Kazuhiko Inoue , Atsushi Ando , Munehiro Ogasawara , John Hartley
- Applicant: NuFlare Technology, Inc. , NuFlare Technology America, Inc.
- Applicant Address: JP Yokohama; US CA Sunnyvale
- Assignee: NuFlare Technology, Inc.,NuFlare Technology America, Inc.
- Current Assignee: NuFlare Technology, Inc.,NuFlare Technology America, Inc.
- Current Assignee Address: JP Yokohama; US CA Sunnyvale
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01J37/06
- IPC: H01J37/06 ; H01J37/20 ; H01J37/24 ; H01J37/10 ; H01J37/063 ; H01J37/244

Abstract:
A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.
Public/Granted literature
- US20200286704A1 MULTIPLE ELECTRON BEAMS IRRADIATION APPARATUS Public/Granted day:2020-09-10
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