公开(公告)号：US20240242918A1

公开(公告)日：2024-07-18

申请号：US18559160

申请日：2021-05-21

Applicant: Hitachi High-Tech Corporation

Inventor： RYO SUGIYAMA ,  Kenji TANIMOTO ,  Shuhei ISHIKAWA

IPC: H01J37/07 ,  H01J37/063 ,  H01J37/08

CPC classification number: H01J37/07 ,  H01J37/063 ,  H01J37/08 ,  H01J2237/038 ,  H01J2237/04735 ,  H01J2237/061

Abstract: Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

公开(公告)号：US11961703B2

公开(公告)日：2024-04-16

申请号：US16904798

申请日：2020-06-18

Applicant: NuFlare Technology, Inc.

Inventor： Chosaku Noda

IPC: H01J37/317 ,  H01J37/063 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/063 ,  H01J37/10 ,  H01J37/3177 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A beam arrangement portion is provided to arrange multiple primary electron beams on a substrate. The beam arrangement portion arranges the multiple primary electron beams in a square lattice along a first moving direction of a stage allowing the substrate to be placed thereon and a second moving direction perpendicular to the first moving direction in a state where, when the multiple primary electron beams are viewed as a whole, beams around four corners of the square lattice are omitted.

公开(公告)号：US11517975B2

公开(公告)日：2022-12-06

申请号：US16195970

申请日：2018-11-20

Applicant: Arcam AB

Inventor： Mattias Fager ,  Johan Backlund

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/063 ,  B23K15/00 ,  H01J37/18 ,  H01J37/09 ,  B33Y10/00 ,  B33Y30/00 ,  B23K15/06 ,  B33Y50/02 ,  B29C64/153 ,  B29C64/268 ,  H01J37/304 ,  B29C64/393 ,  H01J37/301 ,  B22F10/20 ,  B22F10/30

Abstract: An electron beam source including a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further including a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US11361934B2

公开(公告)日：2022-06-14

申请号：US16820016

申请日：2020-03-16

Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.

Inventor： Toshikazu Hiasa ,  Manami Taniguchi

IPC: H01J37/08 ,  H01J37/02 ,  H01J37/063 ,  H01J37/32

Abstract: There is provided an ion source device including a pair of first electrodes for emitting an electron, a second electrode that defines a region in which the electron is enclosed and to which raw material source gas is supplied, between the pair of first electrodes, and that has a hole portion through which an ion generated by collision between the electron and the material gas is extruded, an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, and an intermediate electrode disposed between the second electrode and the extraction electrode. A first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

公开(公告)号：US11335608B2

公开(公告)日：2022-05-17

申请号：US17224407

申请日：2021-04-07

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/00 ,  H01L21/66 ,  H01J37/063 ,  H01J37/065 ,  H01J37/244 ,  H01J37/14

Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

公开(公告)号：US20200303153A1

公开(公告)日：2020-09-24

申请号：US16818675

申请日：2020-03-13

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Syuta Ochi

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/32 ,  H01J37/063

Abstract: An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.

公开(公告)号：US20200219695A1

公开(公告)日：2020-07-09

申请号：US16820016

申请日：2020-03-16

Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.

Inventor： Toshikazu Hiasa ,  Manami Taniguchi

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/063 ,  H01J37/02

Abstract: There is provided an ion source device including a pair of first electrodes for emitting an electron, a second electrode that defines a region in which the electron is enclosed and to which raw material source gas is supplied, between the pair of first electrodes, and that has a hole portion through which an ion generated by collision between the electron and the material gas is extruded, an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, and an intermediate electrode disposed between the second electrode and the extraction electrode. A first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

公开(公告)号：US20190193192A1

公开(公告)日：2019-06-27

申请号：US16195970

申请日：2018-11-20

Applicant: Arcam AB

Inventor： Mattias Fager ,  Johan Backlund

IPC: B23K15/00 ,  H01J37/147 ,  H01J37/063 ,  H01J37/18 ,  H01J37/09 ,  H01J37/10 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: B23K15/0086 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0046 ,  B23K15/06 ,  B29C64/153 ,  B29C64/268 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/063 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3045 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/3128 ,  H01J2237/316

Abstract: An electron beam source comprising a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further comprising a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US10147581B2

公开(公告)日：2018-12-04

申请号：US15233198

申请日：2016-08-10

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Jun Tae Kang ,  Yoon-Ho Song ,  Jae-Woo Kim ,  Jin-Woo Jeong

IPC: H01J7/18 ,  H01J19/48 ,  H01J21/20 ,  H01J29/50 ,  H01J35/16 ,  H01J35/20 ,  H01J37/06 ,  H01J37/063 ,  H01J29/48 ,  H01J35/06 ,  H01J9/39 ,  H01J29/46

Abstract: Disclosed is an x-ray tube including a hybrid electron emission source, which uses, as an electron emission source, a cathode including both a field electron emission source and a thermal electron emission source. An x-ray tube includes an electron emission source emitting an electron beam, and a target part including a target material that emits an x-ray as the emitted electron beam collides with the target part, wherein the electron emission source includes a thermal electron emission source and a field electron emission source, and emits the electron beam by selectively using at least one of the thermal electron emission source and the field electron emission source.

公开(公告)号：US09818569B2

公开(公告)日：2017-11-14

申请号：US14587634

申请日：2014-12-31

Applicant: Rad Source Technologies, Inc.

Inventor： Phillip Kent Ausburn

IPC: H01J35/32 ,  H01J35/18 ,  H01J35/08 ,  H01J37/06 ,  H01J19/32 ,  H01J19/48 ,  H01J1/16 ,  H01J1/40 ,  H01J37/063 ,  H01J35/06 ,  H01J35/16 ,  H01J1/94 ,  A61B6/00 ,  H01J19/57

CPC classification number: H01J19/32 ,  A61B6/40 ,  A61B6/482 ,  H01J1/16 ,  H01J1/40 ,  H01J1/94 ,  H01J19/48 ,  H01J19/57 ,  H01J35/06 ,  H01J35/08 ,  H01J35/16 ,  H01J35/18 ,  H01J35/32 ,  H01J37/063 ,  H01J2235/087 ,  H01J2235/186 ,  H01J2893/0006 ,  H01J2893/0012

Abstract: A high dose output, through transmission target X-ray tube and methods of use includes, in general an X-ray tube for accelerating electrons under a high voltage potential having an evacuated high voltage housing, a hemispherical shaped through transmission target anode disposed in said housing, a cathode structure to deflect the electrons toward the hemispherical anode disposed in said housing, a filament located in the geometric center of the anode hemisphere disposed in said housing, a power supply connected to said cathode to provide accelerating voltage to the electrons.