Invention Grant
- Patent Title: Substrate structure and manufacturing method thereof
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Application No.: US16673967Application Date: 2019-11-05
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Publication No.: US11201123B2Publication Date: 2021-12-14
- Inventor: Chun-Hsien Chien , Po-Chen Lin , Wen-Liang Yeh , Chien-Chou Chen
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: JCIPRNET
- Priority: TW107144688 20181212,TW108130141 20190823
- Main IPC: H01L23/15
- IPC: H01L23/15 ; H01L23/00 ; H01L23/498 ; H01L23/66 ; H01L21/48 ; H01Q1/24

Abstract:
A substrate structure includes a glass substrate, a first circuit layer, a second circuit layer, and at least one conductive region. The glass substrate has a first surface and a second surface opposing the first surface. The first circuit layer is disposed on the first surface. The second circuit layer is disposed on the second surface. The conductive region includes a plurality of conductive micro vias. The conductive micro vias penetrate through the glass substrate. The conductive micro vias are electrically connected to the first circuit layer and the second circuit layer, and the conductive micro vias have a via size of 2 μm to 10 μm.
Information query
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