Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US17049353Application Date: 2018-04-26
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Publication No.: US11211224B2Publication Date: 2021-12-28
- Inventor: Nobuhiro Okai , Daisuke Bizen , Tomoyasu Shojo , Naomasa Suzuki , Muneyuki Fukuda
- Applicant: HITACHI HIGH-TECH CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Volpe Koenig
- International Application: PCT/JP2018/016980 WO 20180426
- International Announcement: WO2019/207707 WO 20191031
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/147 ; H01J37/28 ; H01J37/12

Abstract:
To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.
Public/Granted literature
- US20210249221A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2021-08-12
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