The present disclosure is directed to novel germanosilicate compositions and methods of producing and using the same. Included among the new materials are the new germanosilicates of CIT-5 topology having Si:Ge ratios either in a range of from 3.8 to 5.4 or from 30 to 200, with and without added metal oxides. The disclosure also describes methods of preparing and using these new germanosilicate compositions as well as the compositions themselves.