Invention Grant
- Patent Title: Ion-doped two-dimensional nanomaterials
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Application No.: US16484024Application Date: 2017-09-11
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Publication No.: US11325343B2Publication Date: 2022-05-10
- Inventor: Swastik Kar , Ji Hao , Daniel Rubin , Yung Joon Jung
- Applicant: Northeastern University
- Applicant Address: US MA Boston
- Assignee: Northeastern University
- Current Assignee: Northeastern University
- Current Assignee Address: US MA Boston
- Agency: Verrill Dana, LLP
- International Application: PCT/US2017/051027 WO 20170911
- International Announcement: WO2018/144069 WO 20180809
- Main IPC: B32B5/16
- IPC: B32B5/16 ; C01B32/194 ; H01L29/06 ; B82Y30/00 ; B82Y40/00

Abstract:
Ion-doped two-dimensional nanomaterials are made by inducing electronic carriers (electrons and holes) in a two-dimensional material using a captured ion layer at the surface of the material. The captured ion layer is stabilized using a capping layer. The induction of electronic carriers works in atomically-thin two-dimensional materials, where it induces high carrier density of at least 1014 carriers/cm2. A variety of novel ion-doped nanomaterials and p-n junction-based nanoelectronic devices are made possible by the method.
Public/Granted literature
- US20200094515A1 Ion-Doped Two-Dimensional Nanomaterials Public/Granted day:2020-03-26
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