Invention Grant
- Patent Title: Shadow mask apparatus and methods for variable etch depths
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Application No.: US16789591Application Date: 2020-02-13
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Publication No.: US11335531B2Publication Date: 2022-05-17
- Inventor: Joseph C. Olson , Morgan Evans , Thomas Soldi , Rutger Meyer Timmerman Thijssen , Maurice Emerson Peploski
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: KDB
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J29/07 ; H01J37/20 ; H01J37/305

Abstract:
Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.
Public/Granted literature
- US20210257179A1 SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS Public/Granted day:2021-08-19
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