Invention Grant
- Patent Title: Modulation of ion beam angle
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Application No.: US16705159Application Date: 2019-12-05
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Publication No.: US11367589B2Publication Date: 2022-06-21
- Inventor: Joseph C. Olson , Morgan Evans , Rutger Meyer Timmerman Thijssen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J37/305 ; G02B6/136 ; H01J37/147 ; H01J37/20 ; G02B6/12

Abstract:
Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.
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