Invention Grant
- Patent Title: Ion generator and ion implanter
-
Application No.: US16818675Application Date: 2020-03-13
-
Publication No.: US11380512B2Publication Date: 2022-07-05
- Inventor: Syuta Ochi
- Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Current Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Priority: JPJP2019-049842 20190318
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/317 ; H01J37/063 ; H01J37/32

Abstract:
An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.
Public/Granted literature
- US20200303153A1 ION GENERATOR AND ION IMPLANTER Public/Granted day:2020-09-24
Information query