Invention Grant
- Patent Title: Extreme ultraviolet light condensation mirror, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
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Application No.: US17004473Application Date: 2020-08-27
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Publication No.: US11409027B2Publication Date: 2022-08-09
- Inventor: Masayuki Morita
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-187100 20191010
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G03F7/20 ; H05G2/00

Abstract:
An extreme ultraviolet light condensation mirror may include a reflective surface formed in a concave shape and configured to diffract a laser beam incident from a first focal point and having a wavelength longer than a wavelength of extreme ultraviolet light. The reflective surface may be provided with a plurality of first reflection portions, a plurality of second reflection portions, a plurality of first stepped portions, and a plurality of second stepped portions. The first and second stepped portions may have such heights that the laser beam obtains phases opposite to each other through reflection at the first and second reflection portions adjacent to each other. The height of each first stepped portion may be equal to or higher than the height of each second stepped portion. The height of at least one of the first stepped portions may be higher than the height of each second stepped portion.
Public/Granted literature
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